A parameter study was conducted with the Plasmatherm. This is intended to help users tune there recipes based on the desired profile of the etch. Click on each parameter to view photos. A detailed spreadsheet with measurement will be published here soon.

Table 1: Parameters measured. Standard RIE Parameters

RF Power (W)	650, 750, 850, 950
Loops	10, 20, 30, 40, 50
Deposition Time (sec)	4, 5, 6, 7, 8
Etch Time (sec)	4, 5, 6, 7, 8

RF Power (W)

As the RF power is increased, the etch depth/rate increases then decreases, peaking at 850W.

The initial increase in etch depth/rate is due to the higher energy of the reactive ions, which leads for more efficient material removal. The lower etch performance at higher power can be explain by several different phenomenon include; Ion deflection and scattering, aspect ratio-dependent etching, and charge buildup and deflections.

It seems that the 850W standard parameter is the most optimum. If a slower etch rate is needed, just decrease the RF power.

20 $LaTeX: \mu$ m (3000 Magnification)

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650 W

20um 3kx.jpg

750 W

20um 3kx-1.jpg

850 W

20um 3k.jpg

950 W

20um 3kx-2.jpg

10 $LaTeX: \mu$ m (3000 Magnification)

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650 W

10um 3kx.jpg

750 W

10um 3kx-1.jpg

850 W

10um 3k.jpg

950 W

10um 3kx-2.jpg

8 $LaTeX: \mu$ m (4000 Magnification)

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650 W

8um 4kx.jpg

750 W

8um 4kx-1.jpg

850 W (3000)

8um 3k.jpg

950 W

8um 4kx-2.jpg

7 $LaTeX: \mu$ m (4000 Magnification)

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650 W

7um 4kx.jpg

750 W

7um 4kx-1.jpg

850 W (3000)

7um 3k.jpg

950 W

7um 4kx-2.jpg

5 $LaTeX: \mu$ m (4000 Magnification)

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650 W

5um 4kx.jpg

750 W

5um 4kx-1.jpg

850 W

5um 4k.jpg

950 W

5um 4kx-2.jpg

3 $LaTeX: \mu$ m (4000 Magnification)

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650 W

3um 4kx.jpg

750 W

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850 W

3um 4k.jpg

950 W

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Loops

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10 Loops (5000)

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20 Loops (4000)

20um 4k.jpg

30 Loops (3000)

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40 Loops (3000)

20um 3k-2.jpg

50 Loops (2000)

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10 Loops (5000)

10um 5k.jpg

20 Loops (4000)

10um 4k.jpg

30 Loops (3000)

10um 3k-1.jpg

40 Loops (2000)

10um 2k.jpg

50 Loops (2000)

8 $LaTeX: \mu$ m (Varied Magnification)

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10 Loops (6000)

8um 6k.jpg

20 Loops (5000)

8um 5k.jpg

30 Loops (3000)

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40 Loops (2000)

8um 2k.jpg

50 Loops (2000)

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10 Loops (6000)

7um 6k.jpg

20 Loops (5000)

7um 5k.jpg

30 Loops (3000)

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40 Loops (2000)

50 Loops (2000)

5 $LaTeX: \mu$ m (Varied Magnification)

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10 Loops (6000)

5um 6k.jpg

20 Loops (6000)

5um 6k-1.jpg

30 Loops (4000)

5um 4k-1.jpg

40 Loops (2000)

50 Loops (2000)

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10 Loops (6000)

3um 6k.jpg

20 Loops (8000)

3um 8k.jpg

30 Loops (4000)

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Deposition Time (sec)

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4 sec (2000)

5 sec

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6 sec

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7 sec

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8 sec

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4 sec

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5 sec

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6 sec

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7 sec

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8 sec

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8 $LaTeX: \mu$ m (4000 Magnification)

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4 sec

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5 sec

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6 sec

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7 sec (5000)

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8 sec

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4 sec

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5 sec

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6 sec

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7 sec (5000)

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8 sec

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5 $LaTeX: \mu$ m (4000 Magnification)

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4 sec

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5 sec

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6 sec

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7 sec (5000)

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8 sec

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3 $LaTeX: \mu$ m (4000 Magnification)

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4 sec

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5 sec

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6 sec

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7 sec (5000)

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8 sec

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Etch Time (sec)

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4 sec

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5 sec

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6 sec

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7 sec

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8 sec

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4 sec

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5 sec

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6 sec

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8 sec

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4 sec

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5 sec

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6 sec

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7 sec

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8 sec (3000)

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8 sec (3000)

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4 sec

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5 sec

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6 sec

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8 sec

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6 sec

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